Toshima offers sputtering targets, metal powder, grain, MOCVD precursors, spin-coating solutions and various materials for thin-film formations.
Our products have good reputation among Japanese official research institutions and overseas corporate laboratories.
Short lead time achieved by our consistent in-house production system
In order to correspond to customer's technical and development requirements, we build the integrated facilities for the whole production process from powder treatment to sintering, processing and bonding.
Our original hot-press sintering equipments attain high productivity and efficiency
External partnership for quality management and analysis network
In addition to in-house analysis by ICP, XRD, XRF, TG-DTA, SEM and Particle size analyzer, we achieve high product reliability by external analysis system such as EPMA, EDX and other instruments thanks to close partnership with institutions.
New factory for mass production
Following market needs, we built a new factory that produces hundreds of sputtering targets per month.
We also have mass production facilities for metal and oxide powder, as well as MOCVD precursors.
Sputtering targets, PLD targets, Powder, Ingot
Following customers' requirements, we supply various products, such as sputtering targets, powder, and ingots.
We deal with broad type of elements such as pure metal, complex oxide and alloys.
We produce any size of sputtering targets from small size for R&D to maximum-size of 14 inches. The longest rectangular target reaching 1800mm-length is also available.
We also supply powder prepared by solid-solid reaction method as well as by wet process method. Fine powder in controlled sizes is also available.
We welcome any order volume from grams to kilograms for powder and from one piece to several hundred pieces for sputtering targets.
MOCVD precursor
Toshima offers MOCVD precursors suitable for ferroelectrics, superconductors and transparent electrodes. Especially, we produce various β-diketone metal organic complex selections that best suit oxide thin-film formation.
We also help with matching MOCVD precursors to customer's equipment.
MOD coating solution
Toshima offers many types of MOD solutions for oxide thin-film deposition.
Preparation of particular composition ratio is also available.
Bonding and backing plates
Toshima developed bonding solutions optimum for all types of sputtering targets.
We respond quickly to requests by customers to all bonding processes such as bonding and re-bonding, recycle of used targets, and production of backing plates.
Analyzing
Through a lot of analysis experience for thin film materials, we get requests for various kinds of analysis and measuring. Toshima is registered as a "Certified Environmental Survey Measurement Services".
Please consult with us about environment analysis and drainage water measurement.
Outsourcing
Our skilled technicians help customers develop products for their specific needs.
Toshima technicians have rich experiences of scientific publications as well as fruitful results of the joint research with institutions.
We are pleasure to develop not only the each process instead of the customer such as material design, production, and evaluation but also the whole processes, for example, as joint research.
