Nb2O5 known as the material for anti-reflection (AR) film of displays is sputtered generally by reactive sputtering method using Nb metal.
In this case, productivity is the problem because a lot of O2 flow during sputtering is necessary.
Also, Nb2O5 oxide targets are not used in mass production due to expensive price for targets and slow sputtering rate.
Toshima's Nb2Ox targets resolve all above problems with little O2 flow and customers enjoy high quality Nb2O5 thin film.
Optical Property
| Target | Load Power | Ar / O2 Proportion | Thickness |
|---|---|---|---|
| Φ 200 | PulseDC 3KW | 85 / 15 | 70mn |
| n (Refractive Index) | |||
| 405nm | 550nm | 635nm | 1550nm |
| 2.57 | 2.35 | 2.305 | 2.22 |
| k (Attenuation Coefficient) | |||
| 405nm | 550nm | 635nm | 1550nm |
| 1.29E-03 | -1.97E-02 | -1.38E-02 | 2.54E-12 |
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Optical Property
