Toshima Manufacturing Co., Ltd. Materials System Division
TOSHIMA Manufacturing Co.,Ltd. Materials System Division
Toshima Manufacturing Co., Ltd. Materials System Division
Toshima Manufacturing Co., Ltd. Materials System Division

Optical functional materials

Transparent oxide semiconductor materials are attracting attention due to IGZO. Toshima deals with some kind of oxide and compound materials by long experience and technical knowledge.

Transparence oxide semiconductor

N TYPE
ZnO
SnO2
In2O3
InGaZnO4(IGZO)
InZnSnOX(IZTO)
Zn2SnO4
P TYPE
Cu2O
NiO(+Li)
SnO
CuAlO2
CuCrO2
SrCu2O2
ZnRh2O4
ZnIr2O4

Transparent conductive film

ITO
ZnO-Al2O3
ZnO-Ga2O3
SnO2-Sb2O3
Ti-Nb-Ox

Heat energy reflective film

Ag-alloy
ITO
ZnO

Anti-reflective film

MgF2
Nb2OX
Al2O3
Ta2O5
TiO2-SiO2

Reflective film

Ag-alloy
Al-alloy

LED

ITO
Ti-Nb-Ox
GaN
InN
SnO2-Sb2O3(ATO)

Optical media

CuSi
GeSbTe


Feel free to contact us if you have any other inquiries besides above.

For various optical applications as touch panel, requests that optical mismatching with multilayer is solved are increasing. Toshima is developing and providing flexibility matching materials according to wavelength band.

 MaterialsPropertiesRefractive
index
at 550nm
Resistivitye
(Ω・cm)
Heate
conductivitye
(W/m・K)
Thermale
expansione
coefficiente
(10-6/K)
Flexurale
strengthe
(Mpa)
For
Nb2O5
layer
Nb2OxNb12O292.35*≦0.0342
Nb2Ox-Al2O370:30 mol%2.0*≦0.5
For
SiOx
layer
Si-C*69.7:30.3mol%1.46~1.47*≦0.021102.9240
Si-Al*95:5 wt%1.48*≦0.5
Si(B dope)*Crystalline1.44*≦0.0277~85

* On O2 reactive process