It is important to select combinations of MOCVD precursors because the selection criteria such as reactivity, vaporization, and thermo-stability is different from required characteristics of films such as surface, electric, and mechanical properties.
Toshima has been developing and merchandising various types of MOCVD precursors in response to customers' needs. Especially, we focus on MOCVD precursors used for oxides.
By change of structure of β-diketone ligand or DPM-complex, we develop the materials with various physical properties.
Minimum unit for orders is 5 grams with not only a glass ample but a SUS cylinder following customers' request. Also, in collaboration with our research-partner, Meisei University, we analyze MOCVD precursors on how thin-film is formed.
Further, after investigation of MOCVD precursors, we make presentations for our academic papers in various conferences.
S:>1mol/l A:1-0.5mol/l B:0.5-0.33mol/l
C:0.33-0.25mol/l D:0.25-0.2mol/l E:0.2-0.15mol/l
We can regulate composition or density depending on the demand of customer. We work on the development of experimental materials.