Toshima Manufacturing Co., Ltd. Materials System Division
TOSHIMA Manufacturing Co.,Ltd. Materials System Division
Toshima Manufacturing Co., Ltd. Materials System Division
Toshima Manufacturing Co., Ltd. Materials System Division

Sputter coating service

We are accepting sputtering deposition service so that we can assist you in research and development. If you are having trouble with sputtering, please contact us.

TM-3

Sputtering system that is suitable for functional ceramics film 

TM-3 sputtering system is capable of variety of sputtering condition such as substrate heating and lamination. This system can sputter functional ceramics such as TCO, TAOS, and thin film Li battery materials.
Example: ITO, TNO, IGZO, LLZ, LCO, LiFePO4, etc

TM-3
  • Sputtering source
  • magnetron
  • Power source
  • DC 1kW RF 500W
  • Cathode number
  • 3 cathode
  • Gas source
  • 3 lines (Ar, O2, N2)
  • Substrate heating
  • 600℃ (MAX)
  • Substrate size
  • up to 50×50mm 4 pcs/batch
  • Other
  • reverse sputtering
L560

Sputtering system with high productivity

L560 sputtering system is good for cost performance. It is applicable for single layer and metal layer as well as decorative film and protective film.
Example: Single element metal, TiN, SiO2, Si3N4, ZnO, etc

TM-3
  • Sputtering source
  • magnetron
  • Power source
  • DC 10kW RF 1kW
  • Cathode number
  • 1 cathode
  • Gas source
  • 3 lines (Ar, O2, N2)
  • Substrate heating
  • 150℃
  • Substrate size
  • up to 50×50mm 10 pcs/batch up to 30×30mm 15pcs/batch